超声波清洁机的电流与电压经
关于超声波清洗机的电流与电压设计以及频率_济南洁升超声波清洗机
An object is made up of atoms and molecules. The atom consists of a nucleus (with a positive charge) and an electron (with a negative charge). The charge moves in one direction to form a current.
Although there is a lot of charge inside the object, not all charges can move freely. As long as a part of the outer electrons are weakly attracted by the nucleus, the metal atoms become free 超声波清洗机electrons that can move in the metal. The current in the metal is the directional movement of these free electrons.
物体是由原子和分子构成的，原子由原子核(带正电荷)和电子(带负电荷)构成，电荷在物体内向一个方向移动就构成电流。
To generate current in a conductor, there is only a free electron, and there must be certain external conditions. In order for a continuous current to flow through the conductor, it is necessary to maintain a certain potential difference at both ends of the conductor (usually guaranteed by the power supply), and the potential difference is usually called voltage.
尽管物体内部存在着很多电荷，但并不是一切电荷都能自在移动。金属原子只要一部分外层电子受原子核的吸引力比较弱，而变成能够在金属中自有运动的自在电子。金属中的电流即是这些自在电子的定向移动构成的。
Their physical connection is: the existence of free electrons is the internal cause of current, and voltage is the external cause of current.
要在导体内发生电流，只存在自在电子还不可，还得有必定的外界条件。要使导体中有继续电流流过，导体两头有必要坚持必定的电位差(通常由电源来供给保证)，电位差通常称为电压。
The current and voltage of the ultrasonic cleaner are planned together to obtain ultrasonic waves, and then the object is cleaned. Ultrasonic cleaning machine is also, the frequency is low, the simpler the cavitation occurs, and the liquid is subjected to the tightening and rare action at a low frequency for a longer time distance, so that the bubble can grow to a larger size before the collapse, and the height is increased. The cavitation strength is good for cleaning.
他们的物理联系是：自在电子的存在是构成电流的内因，电压是构成电流的外因。
Therefore, low-frequency ultrasonic cleaning is suitable for the appearance of large parts or the combination of dirt and cleaning parts. However, it is easy to corrode the appearance of the cleaning parts, and it is not suitable for cleaning the parts with high surface finish, and the cavitation noise is large. The frequency of 40KHZ swing, under the same sound intensity, the number of cavitation bubbles is more than the frequency of 20KHZ, the penetrating power is strong, it is better to clean the workpiece with disordered appearance or blind holes, the cavitation noise is small, but empty The strength is low, and it is suitable for the occasion where the cleaning dirt is weakly combined with the surface of the cleaning member. High-frequency ultrasonic cleaning is suitable for computer, precision cleaning of microelectronic components. ;MHz ultrasonic cleaning is suitable for cleaning integrated circuit chips, silicon wafers and wave films. It can remove micron and submicron dirt without any cleaning parts. damage.
超声波清洁机的电流与电压经过共同规划，才干得到超声波，然后对物体进行清洁。超声波清洁机也即是，频率低，空化越简单发生，而且在低频情况下液体遭到的紧缩和稀少作用有更长的时刻距离，使气泡在溃散前能生长到较大的尺寸，增高空化强度，有利于清洁作用。
Therefore, from the cleaning effect and economic thinking, the frequency is usually selected in the 20\u0026mdash;130KHZ scale. Of course, the accurate selection of the frequency is very important, and the selection of the specific suitable working frequency needs to be obtained by certain tests. 所以低频超声清洁适用于大部件外表或者污物和清洁件外表结合度高的场合。但易腐蚀清洁件外表，不适宜清洁外表光洁度高的部件，而且空化噪音大。40KHZ摆布的频率，在相同声强下，发生的空化泡数量比频率为20KHZ时多，穿透力较强，宜清洁外表形状杂乱或有盲孔的工件，空化噪音较小，但空化强度较低，适宜清洁污物与被清洁件外表结合力较弱的场合。高频超声清洁适用于计算机，微电子元件的精密清洁;兆赫超声清洁适用于集成电路芯片、硅片及波薄膜的清洁，能去除微米、亚微米级的污物而对清洁件没有任何损害。
Although there is a lot of charge inside the object, not all charges can move freely. As long as a part of the outer electrons are weakly attracted by the nucleus, the metal atoms become free 超声波清洗机electrons that can move in the metal. The current in the metal is the directional movement of these free electrons.
物体是由原子和分子构成的，原子由原子核(带正电荷)和电子(带负电荷)构成，电荷在物体内向一个方向移动就构成电流。
To generate current in a conductor, there is only a free electron, and there must be certain external conditions. In order for a continuous current to flow through the conductor, it is necessary to maintain a certain potential difference at both ends of the conductor (usually guaranteed by the power supply), and the potential difference is usually called voltage.
尽管物体内部存在着很多电荷，但并不是一切电荷都能自在移动。金属原子只要一部分外层电子受原子核的吸引力比较弱，而变成能够在金属中自有运动的自在电子。金属中的电流即是这些自在电子的定向移动构成的。
Their physical connection is: the existence of free electrons is the internal cause of current, and voltage is the external cause of current.
要在导体内发生电流，只存在自在电子还不可，还得有必定的外界条件。要使导体中有继续电流流过，导体两头有必要坚持必定的电位差(通常由电源来供给保证)，电位差通常称为电压。
The current and voltage of the ultrasonic cleaner are planned together to obtain ultrasonic waves, and then the object is cleaned. Ultrasonic cleaning machine is also, the frequency is low, the simpler the cavitation occurs, and the liquid is subjected to the tightening and rare action at a low frequency for a longer time distance, so that the bubble can grow to a larger size before the collapse, and the height is increased. The cavitation strength is good for cleaning.
他们的物理联系是：自在电子的存在是构成电流的内因，电压是构成电流的外因。
Therefore, low-frequency ultrasonic cleaning is suitable for the appearance of large parts or the combination of dirt and cleaning parts. However, it is easy to corrode the appearance of the cleaning parts, and it is not suitable for cleaning the parts with high surface finish, and the cavitation noise is large. The frequency of 40KHZ swing, under the same sound intensity, the number of cavitation bubbles is more than the frequency of 20KHZ, the penetrating power is strong, it is better to clean the workpiece with disordered appearance or blind holes, the cavitation noise is small, but empty The strength is low, and it is suitable for the occasion where the cleaning dirt is weakly combined with the surface of the cleaning member. High-frequency ultrasonic cleaning is suitable for computer, precision cleaning of microelectronic components. ;MHz ultrasonic cleaning is suitable for cleaning integrated circuit chips, silicon wafers and wave films. It can remove micron and submicron dirt without any cleaning parts. damage.
超声波清洁机的电流与电压经过共同规划，才干得到超声波，然后对物体进行清洁。超声波清洁机也即是，频率低，空化越简单发生，而且在低频情况下液体遭到的紧缩和稀少作用有更长的时刻距离，使气泡在溃散前能生长到较大的尺寸，增高空化强度，有利于清洁作用。
Therefore, from the cleaning effect and economic thinking, the frequency is usually selected in the 20\u0026mdash;130KHZ scale. Of course, the accurate selection of the frequency is very important, and the selection of the specific suitable working frequency needs to be obtained by certain tests. 所以低频超声清洁适用于大部件外表或者污物和清洁件外表结合度高的场合。但易腐蚀清洁件外表，不适宜清洁外表光洁度高的部件，而且空化噪音大。40KHZ摆布的频率，在相同声强下，发生的空化泡数量比频率为20KHZ时多，穿透力较强，宜清洁外表形状杂乱或有盲孔的工件，空化噪音较小，但空化强度较低，适宜清洁污物与被清洁件外表结合力较弱的场合。高频超声清洁适用于计算机，微电子元件的精密清洁;兆赫超声清洁适用于集成电路芯片、硅片及波薄膜的清洁，能去除微米、亚微米级的污物而对清洁件没有任何损害。
因此从清洁作用及经济性思考，频率通常挑选在20—130KHZ规模，当然准确挑选频率至关重要，而具体适宜的工作频率的选择需要做必定的试验获得。
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